METHOD OF FORMING MAIN POLE OF THERMALLY-ASSISTED

专利名称：METHOD OF FORMING MAIN POLE OF

THERMALLY-ASSISTED MAGNETICRECORDING HEAD

发明人：Hironori ARAKI,Yoshitaka SASAKI,Hiroyuki

ITO,Kazuki SATO,ShigekiTANEMURA,Yukinori IKEGAWA

申请号：US13110442申请日：20110518

公开号：US20120292287A1公开日：20121122

专利附图：

摘要：In a method of forming a main pole, an initial accommodation layer is etched byRIE using a first etching mask having a first opening, whereby a groove is formed in theinitial accommodation layer. Next, a part of the initial accommodation layer including thegroove is etched by RIE using a second etching mask having a second opening, so that thegroove becomes an accommodation part. The main pole is then formed in the

accommodation part. The first etching mask has first and second sidewalls that face thefirst opening and are opposed to each other at a first distance in a track width direction.The second etching mask has third and fourth sidewalls that face the second opening andare opposed to each other at a second distance greater than the first distance.

申请人：Hironori ARAKI,Yoshitaka SASAKI,Hiroyuki ITO,Kazuki SATO,ShigekiTANEMURA,Yukinori IKEGAWA

地址：Milpitas CA US,Santa Clara CA US,Milpitas CA US,Milpitas CA US,Milpitas CAUS,Milpitas CA US

国籍：US,US,US,US,US,US

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