Method for producing silica glass for use with lig

专利名称：Method for producing silica glass for use

with light in a vacuum ultraviolet wavelengthrange

发明人：Hiroyuki Hiraiwa,Seishi Fujiwara,Norio

Komine

申请号：US08/498157申请日：19950705公开号：US05679125A公开日：19971021

摘要：A method for producing a synthetic silica glass for use with vacuum ultravioletlight comprises the steps of: (a) producing a soot preform; (b) heating the soot preformin an atmosphere containing fluorine to obtain a fluorine-doped soot preform; (c)consolidating the fluorine- doped soot preform to obtain a fluorine-doped syntheticsilica glass; and (d) heating the fluorine-doped synthetic silica glass in an atmospherecontaining hydrogen gas to obtain a synthetic silica glass doped with fluorine andhydrogen molecules. A synthetic silica glass having both a high transmittance and highultraviolet light resistance with respect to light in the vacuum ultraviolet wavelengthrange can be produced.

申请人：NIKON CORPORATION

代理机构：Pennie & Edmonds LLP

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