Process for coating a flat substrate with an U.V.

专利名称：Process for coating a flat substrate with an

U.V. curable lacker

发明人：SCHNEIDER, MANFRED, DIPL. ING.,EWALD,

EGON

申请号：EP95115015.0申请日：19950923公开号：EP0706834A1公开日：19960417

摘要：A process is claimed for the prodn. of 2-dimensional coated materials with amatt or gloss surface, in which the substrate (A) consists of single- or multi-layer plasticor paper strip(s) with a total thickness of 80-500 microns. The substrate is coated, eitherdirectly or over an interlayer or plastic interlayer, with a UV-curable varnish (B) contg.monomeric acrylate(s) (mono-, di-, tri- and/or tetra-acrylate) (I) and opt. conventionaladditives. This varnish is produced by reacting monomer(s) (I) with acrylate prepolymer(s)with a mol. wt. of 500-2000 (II), and contains 1-10 pts. wt. UV initiator(s) per 100 pts. wt.(without additives etc.). The dullness of the coating is adjusted by the addn. of mono-and/or di-functional monomers (III), and UV hardening is effected with several radiationsources with a defined range of wavelengths. Pref. the coated substrate is irradiated firstwith short-wavelength, monochromatic UV in the range 100-200 (pref. 130-190, esp. pref.172) nm., and then with UV with a wavelength more than 2 (pref. 10) nm. longer than thatused in the first stage, pref. at least 200 (esp. pref. 200-900) nm. The UV source(s) for thissecond stage emit(s) monochromatic UV light with a wavelength of 220-450 (pref. 308)nm., and the coated substrate is irradiated with this light while being transported. The

stage 2 UV source is of a higher power and/or intensity than the source used in stage 1,or stage 2 may be carried out with electron beam radiation instead of long wavelengthUV.

申请人：ALKOR GMBH KUNSTSTOFFE

地址：Postfach 71 01 09 D-81451 München DE

国籍：DE

代理机构：Seiler, Siegfried

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