Method for manufacturing array substrate

专利名称：Method for manufacturing array substrate发明人：Zhichao Zhou申请号：US15571346申请日：20170503公开号：US10355031B2公开日：20190716

专利附图：

摘要：A method for manufacturing an array substrate includes forming a buffer layeron a substrate; forming a source and a data line in the buffer layer, forming a first gate, asecond gate, a first scan line, and a second scan line on the buffer layer, simultaneously;forming a semiconductor layer; forming a conductor layer by converting the

semiconductor layer formed on the first scan line and the second scan line into aconductor; forming a first pixel electrode on the semiconductor layer and forming asecond pixel electrode on the conductor layer, simultaneously.

申请人：Shenzhen China Star Optoelectronics Semiconductor Display Technology Co.,LTd.

地址：Shenzhen, Guangdong CN

国籍：CN

代理机构：Hauptman Ham, LLP

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