Vitreous silica crucible for pulling silicon singl

专利名称：Vitreous silica crucible for pulling silicon

single crystals

发明人：Kodama, Makiko,Kishi, Hiroshi,Kanda, Minoru申请号：EP10158853.1申请日：20100331公开号：EP2236469A1公开日：20101006

专利附图：

摘要：Provided is a vitreous silica crucible for pulling silicon single crystals, which canmelt a silicon raw material in a short time and improve production yield of silicon singlecrystals by temporal change of an opaque vitreous silica layer. The vitreous silica crucible

includes an opaque vitreous silica layer(11) provided on an outer surface thereof andcontaining plural bubbles, and a transparent vitreous silica layer(12) provided on an innersurface and not containing bubbles substantially. The opaque vitreous silica layer(11) hasa bubble diameter distribution in which the content of bubbles having a diameter of lessthan 40 µm is 10% or more and less than 30%, the content of bubbles having a diameterof 40 µm or more and less than 90 µm is 40% or more and less than 80%, and thecontent of bubbles having a diameter equal to or more than 90 µm is 10% or more andless than 30%. Relatively small bubbles contained in the opaque vitreous silica layer(11)contribute to the thermal conductivity of a crucible at an initial pulling stage, andrelatively large bubbles contained in the opaque vitreous silica layer are expandedthrough a long-term pulling process to thereby largely contribute to the warmthretaining property of the crucible at a later pulling stage.

申请人：Japan Super Quartz Corporation

地址：5-14-3 Barajima Akita-shi Akita 010-0065 JP

国籍：JP

代理机构：Gulde Hengelhaupt Ziebig & Schneider

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