专利名称：Thermoplastic moulding compositions with
enhanced notch-impact strength
发明人：NIESSNER, NORBERT, DR.,RUPPMICH,
KARL,MOSBACH, NORBERT
申请号：EP93119951.7申请日：19931210公开号：EP0603674B1公开日：19970409
摘要：Thermoplastic moulding compositions containing A) from 10 to 80% by weightof a polymer obtainable by polymerisation of a C1-C20-alkyl ester of methacrylic oracrylic acid, or mixtures of such esters, B) from 10 to 50% by weight of a copolymerobtainable by polymerisation of a monomer mixture of b1) from 73 to 90% by weight of avinyl aromatic monomer and b2) from 27 to 10% by weight of a comonomer selectedfrom the group consisting of acrylonitrile, methacrylonitrile, C1-C8-alkyl esters ofmethacrylic and/or acrylic acid, maleic anhydride and maleimides which are substituted onthe imide nitrogen by a C1-C6-alkyl group, a C6-C10-aryl group or a C6-C10-aryl-C1-C 4-alkyl group, where the aryl radicals may be up to trisubstituted by C1-C4-alkyl, C) from 5to 50% by weight of a graft copolymer obtainable by polymerisation of c1) from 20 to45% by weight of a monomer mixture of a vinyl aromatic monomer and a polar,copolymerisable, ethylenically unsaturated monomer in the presence of c2) from 55 to80% by weight of a graft base obtainable by polymerisation of at least one crosslinked,elastomeric, C1-C20-alkyl ester of acrylic acid having a mean particle diameter (weightaverage) of from 50 to 150 nm, and D) from 5 to 50% by weight of a further graft
copolymer obtainable by polymerisation of d1) from 20 to 60% by weight of a monomermixture of a vinyl aromatic monomer and a polar, copolymerisable, ethylenically
unsaturated monomer in the presence of d2) from 40 to 80% by weight of a crosslinked,elastomeric C1-C20-alkyl ester of acrylic acid as graft base having a mean particlediameter (weight average) of from 200 to 700 nm, and a process for the preparation ofthese thermoplastic moulding compositions, their use for the production of mouldings,and mouldings containing these thermoplastic moulding compositions.
申请人：BASF AKTIENGESELLSCHAFT,BASF AG,BASF AKTIENGESELLSCHAFT
地址：DE
国籍：DE
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