专利名称：Gap-filling for isolation
发明人：Andreas Klipp,Momtchil Stavrev,Moritz
Haupt
申请号：US10881717申请日：20040630
公开号：US20060003546A1公开日：20060105
专利附图：
摘要：A method of filling high ratio trenches on a substrate is described. First, anoxidizable layer is deposited on the substrate. Thereafter, a trench fill oxide is depositedon the substrate and on the oxidizable layer. Afterwards, the resulting structure is
annealed using an oxygen containing gas such that the oxidizable layer is oxidized.
申请人：Andreas Klipp,Momtchil Stavrev,Moritz Haupt
地址：Dresden DE,Dresden DE,Dresden DE
国籍：DE,DE,DE
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