专利名称：FILM FORMING APPARATUS AND FILM
FORMING METHOD
发明人：Yoshihiro TAKEZAWA,Kuniyasu
SAKASHITA,Shigeru NAKAJIMA
申请号：US15841084申请日：20171213
公开号：US20180179630A1公开日：20180628
专利附图：
摘要：A film forming apparatus includes: a substrate holding member for verticallyholding target substrates at predetermined intervals in multiple stages; a process vessel
for accommodating the substrate holding member; a processing gas introductionmember each having gas discharge holes which discharge a processing gas for filmformation in a direction parallel to each target substrate and introduce the processinggas into the process vessel; an exhaust mechanism for exhausting the interior of theprocess vessel; and a plurality of gas flow adjustment members installed to face thetarget substrates, respectively. Each of the gas flow adjustment members adjusts a gasflow of the processing gas discharged horizontally above each of the target substratesfrom the gas discharge holes of the processing gas introduction member, to be directedfrom above the respective target substrate located below the respective gas flowadjustment member toward the surface of the respective target substrate.
申请人：TOKYO ELECTRON LIMITED
地址：Tokyo JP
国籍：JP
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