Polyamic acid, varnish comprising same and polyimi

专利名称：Polyamic acid, varnish comprising same and

polyimide film

发明人：Tatsuhiro Urakami,Masaki Okazaki,Kenichi

Fukukawa,Yoshihiro Sakata,Atsushi Okubo

申请号：US14781927申请日：20140401公开号：US09902810B2公开日：20180227

专利附图：

摘要：The present invention addresses the problem of providing: a polyimide film thathas a small phase difference in the thickness direction and has a low coefficient of linear

thermal expansion; and a polyamic acid and varnish to obtain the same. In order to solvethis problem, the present invention provides a polyimide film which comprises polyimidethat is produced by reacting a diamine component and a tetracarboxylic dianhydridecomponent, the polyimide film having a coefficient of linear thermal expansion of 35ppm/K or less over a temperature range of 100 to 200 DEG C, an absolute value of phasedifference in the thickness direction of 200 nm or less per 10 μm thickness, a glasstransition temperature of 260 DEG C or more, and a total light transmittance of 85% ormore.

申请人：MITSUI CHEMICALS, INC.

地址：Minato-ku, Tokyo JP

国籍：JP

代理机构：Buchanan, Ingersoll & Rooney PC

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