专利名称：Coating film forming apparatus发明人：Takahiro Kitano,Norihisa Koga,Toshichika
Takei,Yoshiyuki Kawafuchi
申请号：US10298932申请日：20021119
公开号：US20030097983A1公开日：20030529
专利附图：
摘要：A substrate is horizontally held by a substrate holding portion freely movablein the Y-direction, and a nozzle portion is provided above and opposing the substrate,and movable in X-direction corresponding to the coating liquid feeding region of the
substrate. A discharge opening is formed at a lower end of the nozzle portion, and achannel connecting the discharge opening with a coating liquid feed tube coupled to anupper end of the nozzle portion is formed within the discharge opening. At themidstream of the channel, a liquid pool portion larger in diameter than the dischargeopening is formed, the inside of which is provided with a filtering member formed byporous bodies blocking the channel. The filtering member forms a pressure loss portion,which absorbs pulsation occurring at the coating liquid feed tube before it reaches thedischarge opening.
申请人：TOKYO ELECTRON LIMITED
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