Fuse structure and method to form the same

专利名称：Fuse structure and method to form the

same

发明人：David K. Anderson,Tien-Jen Cheng,Timothy J.

Dalton,Christopher V. Jahnes,AndrewLu,Chandrasekhar Narayan,Kevin S.

Petrarca,Richard P. Volant,George F. Walker

申请号：US09992344申请日：20011114

公开号：US20030089962A1公开日：20030515

专利附图：

摘要：A method and structure for a fuse structure comprises an insulator layer, aplurality of fuse electrodes extending through the insulator layer to an underlying wiringlayer, an electroplated fuse element connected to the electrodes, and an interface wall.The fuse element is positioned external to the insulator, with a gap juxtaposed betweenthe insulator and the fuse element. The interface wall further comprises a first side wall, asecond side wall, and an inner wall, wherein the inner wall is disposed within the gap. Thefuse electrodes are diametrically opposed to one another, and the fuse element isperpendicularly disposed above the fuse electrodes. The fuse element is eitherelectroplatted, electroless plated, or is an ultra thin fuse.

申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION

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