Spectroscopic scatterometer system

专利名称：Spectroscopic scatterometer system发明人：Yiping Xu,Ibrahim Abdulhalim申请号：US09960898申请日：20010921公开号：US06590656B2公开日：20030708

专利附图：

摘要：Before the diffraction from a diffracting structure on a semiconductor wafer ismeasured, where necessary, the film thickness and index of refraction of the filmsunderneath the structure are first measured using spectroscopic reflectometry orspectroscopic ellipsometry. A rigorous model is then used to calculate intensity or

ellipsometric signatures of the diffracting structure. The diffracting structure is thenmeasured using a spectroscopic scatterometer using polarized and broadband radiationto obtain an intensity or ellipsometric signature of the diffracting structure. Suchsignature is then matched with the signatures in the database to determine the gratingshape parameters of the structure.

申请人：KLA-TENCOR CORPORATION

代理机构：Parsons Hsue & de Runtz LLP

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