专利名称：IMPRINTING METHOD AND
MANUFACTURING METHOD
发明人：Tsutomu Hashimoto,Kiyohito Yamamoto申请号：US16279676申请日：20190219
公开号：US20190265588A1公开日：20190829
专利附图：
摘要：An imprinting method for forming a pattern on a substrate with use of a mold,includes performing a running-in process in which the mold is brought into contact with acomposition on a first substrate held by a holding unit, the composition on the first
substrate is exposed, and the mold is released. After the running-in process, the methodincludes performing an imprinting process in which the mold is brought into contact witha composition on a second substrate, the composition on the second substrate isexposed, the mold is released, and the pattern is formed on the composition on thesecond substrate. A base material of the first substrate is higher in heat conductivity thana base material of the second substrate. The second substrate is used as an imprint mold.
申请人：CANON KABUSHIKI KAISHA
地址：Tokyo JP
国籍：JP
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