专利名称：Method for producing silica glass for use
with light in a vacuum ultraviolet wavelengthrange, and silica glass and optical memberproduced by the method
发明人：Hiraiwa, Hiroyuki,Fujiwara, Seishi,Komine,
Norio
申请号：EP95110671.5申请日：19950707公开号：EP0691312A1公开日：19960110
摘要：A method for producing a synthetic silica glass for use with vacuum ultravioletlight comprises the steps of: (a) producing a soot preform; (b) heating the soot preformin an atmosphere containing fluorine to obtain a fluorine-doped soot preform; (c)consolidating the fluorine-doped soot preform to obtain a fluorine-doped synthetic silicaglass; and (d) heating the fluorine-doped synthetic silica glass in an atmospherecontaining hydrogen gas to obtain a synthetic silica glass doped with fluorine andhydrogen molecules. A synthetic silica glass having both a high transmittance and highultraviolet light resistance with respect to light in the vacuum ultraviolet wavelengthrange can be produced.
申请人：NIKON CORPORATION
地址：2-3, Marunouchi 3-chome Chiyoda-ku Tokyo 100 JP
国籍：JP
代理机构：Hansen, Bernd, Dr. Dipl.-Chem.
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