专利名称：Process for manufacturing silane发明人：Shin-ichi Inaba,Hideki Nagahama申请号：US07/152306申请日：19880204公开号：US04959200A公开日：19900925
摘要：There is here provided a method for manufacturing silane by subjecting a rawmaterial, trialkoxysilane, to a disproportionation reaction in the gaseous phase in thepresence of a catalyst which is an oxide of a metal in the third period of the periodictable. According to the present invention, silane can be obtained effectively without anyby- products, and the reaction can be easily controlled and stopped promptly in anemergency.
申请人：CHISSO CORPORATION
代理机构：Leydig, Voit & Mayer
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