专利名称：Optical barrier and methods for forming the
optical barrier without etching a transparentlayer below the optical barrier
发明人：David W. Hula,Robert G. Long申请号：US09971433申请日：20011005公开号：US06627866B2公开日：20030930
专利附图：
摘要：An optical barrier made of tungsten (W) or titanium-tungsten (TiW). A layer ofthe optical barrier material is deposited over a transparent layer such as indium tin oxide
(ITO). The optical barrier material is then patterned using photolithography processingsteps and a dry etchant. The patterned optical barrier material acts as a light-shieldinglayer over a light-sensing device to form a dark reference device or dark pixel.
申请人：AGILENT TECHNOLOGIES INC
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